ExhibitorEXHIBITORS
Booth number:6A-101, 6A-201, 6A-301
Hitachi High-Tech Corporation
- New Technology
Presentation - WebExpo
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New Technology Presentation
| Date and time | Theme | Hall |
|---|---|---|
| Sept. 6(Wed) 10:15～11:15 | Practice now! How to quickly obtain analysis results with an atomic absorption spectrophotometer. | 304 |
| Sept. 6(Wed) 11:45～12:15 | Ion Milling goes in alldirections.Introduction of Application that contribute to Business efficiency | 102 |
| Sept. 6(Wed) 12:30～13:00 | Practice now! A must-see course for beginner to improve their skills in the field of XRF analysis | 201A |
| Sept. 6(Wed) 14:00～14:30 | New measurement and instrument for phthalate esters by EU RoHS Regulation in the recycled plastics | 104 |
| Sept. 6(Wed) 15:00～15:30 | Introduction of measurement example of Lumione BL3000, a rapid microbial testing by the ATP method | 201B |
| Sept. 6(Wed) 15:45～16:15 | Practice now! Basic Course on Spectrophotometers for Beginners | 105 |
| Sept. 7(Thu) 10:15～10:45 | Introduction to the proper use of 3D shape measuring tools and linkage function(SEM/AFM/CSI) | 201A |
| Sept. 7(Thu) 11:15～11:45 | Forefront of AFM electrical characterzation including preparation, postprocessing and interpretation | 105 |
| Sept. 7(Thu) 12:45～13:15 | Practice now! How to make good use of measurement data from a fluorescence spectrophotometer | 201B |
| Sept. 7(Thu) 14:00～15:00 | Introduction of the latest application of FE-SEM low voltage SEM observation and automation workflow | 302 |
| Sept. 7(Thu) 15:45～16:15 | The Future of MI Using New Image Processing You Need to Know | 103 |
| Sept. 8(Fri) 10:15～11:15 | NEXT Stage for Thermal analysis. The latest applications and functional extension on the DMA. | 304 |
| Sept. 8(Fri) 12:30～13:00 | HPLC Basics -Basic of method development and detector selection- | 201A |
| Sept. 8(Fri) 13:30～14:00 | How the latest TOF-ICP-MS outperforms Q-ICP-MS in fast multi-elemental analysis application. | 101 |
| Sept. 8(Fri) 14:15～14:45 | Practice now! Tips for measurement and analysis in thermal analysis, NEXTA DSC | 301B |
| Sept. 8(Fri) 15:45～16:15 | Practice now!Introduction of ICP-OES measurement method and latest application | 103 |