- Corporate/
Group profiles - Highlights &
Exhibit products - Products
Details - Download information
- New Technology Presentation
- WebExpo
- SNS
■Business details
We design and manufacture batch horizontal and vertical diffusion, PECVD and LPCVD furnaces for semiconductor industries or related R&D institutes. Other products include gas source systems like gas cabinets and valve manifold boxes. The heart of all SVCS tools is in-house designed control system.
■Highlights & Exhibit products
We present on-going CZECH-JAPAN joint development project: ALD Reactor in Minimal Fab Standard. The exhibition is in cooperation with project pertmers:
- National Institute of Advanced Industrial Science and Technology (AIST)
- HORIBA STEC
- YOKOGAWA Solition Service
Table top batch furnace for R&D, production size horizontal and vertical furnaces, ultra high purity gas and liquid delivery systems like gas cabinets are presented as well.
■Products Details
-
ALD Reactor in Minimal Standard
ALD reactor being developed under Japan - Czech joint development project
-
ALD reactor for R&D
Single-wafer ALD reactor for R&D
-
Table Tob Batch Furnace
Table top batch furnace for R&D (diffusion, PECVD, LPCVD, depends on configuration)
-
Vertical Batch Furnace
Vertical batch furnace for semiconductorproduction (diffusion, PECVD, LPCVD)
-
Horizontal Batch Furnace
Horizontal batch furnace for semiconductor production (diffusion, PECVD, LPCVD)
■Download information
