Booth number: 6B-206
  • General Booth

■Business details

We design and manufacture batch horizontal and vertical diffusion, PECVD and LPCVD furnaces for semiconductor industries or related R&D institutes. Other products include gas source systems like gas cabinets and valve manifold boxes. The heart of all SVCS tools is in-house designed control system.

■Highlights & Exhibit products

We present on-going CZECH-JAPAN joint development project: ALD Reactor in Minimal Fab Standard. The exhibition is in cooperation with project pertmers:
- National Institute of Advanced Industrial Science and Technology (AIST)
- HORIBA STEC
- YOKOGAWA Solition Service

Table top batch furnace for R&D, production size horizontal and vertical furnaces, ultra high purity gas and liquid delivery systems like gas cabinets are presented as well.

■Products Details

  • ALD Reactor in Minimal Standard

    ALD reactor being developed under Japan - Czech joint development project

  • ALD reactor for R&D

    Single-wafer ALD reactor for R&D

  • Table Tob Batch Furnace

    Table top batch furnace for R&D (diffusion, PECVD, LPCVD, depends on configuration)

  • Vertical Batch Furnace

    Vertical batch furnace for semiconductorproduction (diffusion, PECVD, LPCVD)

  • Horizontal Batch Furnace

    Horizontal batch furnace for semiconductor production (diffusion, PECVD, LPCVD)

■Download information

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